氮化硅片|氮化硅晶圆|Silicon Nitride Wafers|SiN Wafers
国际品牌、品质保障！
产品概述
英创力科技可以为客户提供高质量的氮化硅硅片，包括：LPCVD类氮化硅片：化学计量LPCVD氮化硅片、低应力LPCVD氮化硅片以及超低应力LPCVD氮化硅片；PECVD氮化硅片：PECVD氮化硅片、低应力PECVD氮化硅片、PECVD氧化氮硅片。可供货晶圆直径从50mm~200mm，氮化硅层厚度为100Å至20,000Å。
最小订货量(MOQ)为25片
Innotronix offers a variety of film processing options for your silicon needs. This includes LPCVD nitride, and Innotronix can provide wafers with stoichiometric LPCVD nitride or low stress LPCVD nitride, as well as super low stress LPCVD nitride. We also offer high quality PECVD nitride, Low stress PECVD nitride, and PECVD OxyNitride. Wafer diameter is available from 2″ to 200mm and nitride thickness is available from 100Å to 20,000Å.
Any amount of quantity can be ordered with a minimum batch order of 25 wafers.
合作厂商
Work With Global Leading manufacturers
规格表
Types of LPCVD Nitride
1. Stoichiometric LPCVD nitride
Film thickness: 100Å – 4500Å on both sides
Film stress: =>800±50 MPa Tensile Stress
2. Low stress LPCVD nitride
Film thickness: 100Å – 20,000Å on both sides
Film stress: <250±50 MPa Tensile Stress
3. Super low stress LPCVD nitride
Film thickness: 100Å – 20,000Å on both sides
Film stress: <100±50 MPa Tensile Stress
Types of PECVD Nitride
1. PECVD nitride
Film thickness: 100Å – 5000Å on one side
Film stress: +400±50 MPa Tensile Stress
2. Low stress PECVD nitride
Film thickness: 100Å – 20,000Å on one side
Film stress: <250±50 MPa Tensile Stress
3. PECVD OxyNitride
Film thickness: 100Å – 20,000Å on one side
Film stress: -400±50 MPa Tensile Stress
可根据客户要求，定制单抛、双抛，PECVD、LPCVD、化学计量 LPCVD等多种氮化硅衬底片。
我们的优势
- 广泛的国际化货源渠道
- 灵活的订货数量
- 深入的增值服务:减薄、外延、划片
应用领域
- 传感器
- 光电子器件
在线询价
电话&邮件询价
联系电话：18600564919
邮件：sales##innotronix.com.cn (用@替代##即可)